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A Robust Computational Algorithm for Inverse Photomask Synthesis in Optical Projection Lithography

  • Published:2012-01 Issue:2 Volume:5 Page:625-651
  • ISSN:1936-4954
  • Container-title:SIAM Journal on Imaging Sciences
  • language:en
  • Short-container-title:SIAM J. Imaging Sci.

Author:

Choy Siu Kai,Jia Ningning,Tong Chong Sze,Tang Man Lai,Lam Edmund Y.

Publisher

Society for Industrial & Applied Mathematics (SIAM)

Subject

Applied Mathematics,General Mathematics

Cited by 13 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. An Alternating Direction Method of Multipliers for Inverse Lithography Problem;Numerical Mathematics: Theory, Methods and Applications;2023-06

2. Topology optimization for optical microlithography with partially coherent illumination;International Journal for Numerical Methods in Engineering;2016-06-16

3. A Variational Approach to the Inverse Photolithography Problem;SIAM Journal on Applied Mathematics;2016-01

4. Cascadic multigrid algorithm for robust inverse mask synthesis in optical lithography;Journal of Micro/Nanolithography, MEMS, and MOEMS;2014-04-28

5. Topology optimization for optical projection lithography with manufacturing uncertainties;Applied Optics;2014-04-18
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