Topology optimization for optical microlithography with partially coherent illumination

Author:

Zhou Mingdong1,Lazarov Boyan S.1,Sigmund Ole1

Affiliation:

1. Section of Solid Mechanics, Department of Mechanical Engineering; Technical University of Denmark; Nils Koppels Allé Building 404 Kgs. Lyngby DK-2800 Denmark

Funder

Danmarks Tekniske Universitet

EU research project ‘LaScISO’

Villum Fonden

Det Frie Forskningsråd

Publisher

Wiley

Subject

Applied Mathematics,General Engineering,Numerical Analysis

Reference45 articles.

1. On the similarities between micro/nano lithography and topology optimization projection methods;Jansen;Structural and Multidisciplinary Optimization,2013

2. Topology optimization for optical projection lithography with manufacturing uncertainties;Zhou;Applied Optics,2014

3. Resolution Enhancement Techniques in Optical Lithography

4. Flexible and efficient approach to E-beam proximity effect correction-PYRAMID. Surface and Interface Analysis;Lee;Proc. of NIST workshop on Modeling Electron Transport for Applications in Electron and X-Ray Analysis and Metrology,2005

5. Proximity correction algorithms and a co-processor based on regularized optimization. I: Description of the algorithm;Peckerar;Journal of Vacuum Science and Technology B,1995

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