Publisher
SPIE-Intl Soc Optical Eng
Subject
Electrical and Electronic Engineering,Mechanical Engineering,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials
Cited by
15 articles.
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1. Nanolithographies;The Frontiers Collection;2015-09-20
2. Electron scattering analysis based on electron ray-tracing in extreme ultraviolet photomask;Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena;2014-07
3. Development of stable extreme-ultraviolet sources for use in lithography exposure systems;Journal of Micro/Nanolithography, MEMS, and MOEMS;2012-06-29
4. Tin laser-produced plasma as the light source for extreme ultraviolet lithography high-volume manufacturing: history, ideal plasma, present status, and prospects;Journal of Micro/Nanolithography, MEMS, and MOEMS;2012-05-21
5. Investigation of EUV haze defect: molecular behaviors of mask cleaning chemicals on EUV mask surfaces;SPIE Proceedings;2012-03-29