A synchrotron radiation x-ray lithography beam line of novel design-Reference-Cited by-同舟云学术

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A synchrotron radiation x-ray lithography beam line of novel design

Published:1985-01 Issue:1 Volume:3 Page:227
ISSN:0734-211X
Container-title:Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
language:
Short-container-title:J. Vac. Sci. Technol. B

Author:

Cerrina F.

Publisher

American Vacuum Society

Subject

General Engineering

Cited by 15 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Arrays of Nanoscale Lenses for Subwavelength Optical Lithography;Nano Letters;2010-09-29

2. Sober view on extreme ultraviolet lithography;Journal of Micro/Nanolithography, MEMS, and MOEMS;2006-07-01

3. Image formation in EUV lithography: Multilayer and resist properties;Microelectronic Engineering;2000-06

4. Design of Beamline Optics for Large-Field Exposure;Japanese Journal of Applied Physics;1998-12-30

5. Performance of a wide-field flux delivery system for synchrotron x-ray lithography;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;1993-11

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