<title>EUV engineering test stand

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EUV engineering test stand

Published:2000-07-21 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
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Author:

Tichenor Daniel A.,Kubiak Glenn D.,Replogle William C.,Klebanoff Leonard E.,Wronosky John B.,Hale Layton C.,Chapman Henry N.,Taylor John S.,Folta James A.,Montcalm Claude,Hudyma Russell M.,Goldberg Kenneth A.,Naulleau Patrick P.

Publisher

SPIE

Cited by 45 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Development of a dynamic gas lock inhibited model for EUV-induced carbon deposition;The Journal of Chemical Physics;2024-01-28

2. Technical and personal remembrances of David A. Shirley in studies of surface magnetism, photoelectron spectroscopy, EUV lithography, and hydrogen storage;Journal of Vacuum Science & Technology A;2022-04-26

3. Room Temperature Oxidation of Ruthenium;The Journal of Physical Chemistry C;2013-07-12

4. Surface Chemistry of Ruthenium Dioxide in Heterogeneous Catalysis and Electrocatalysis: From Fundamental to Applied Research;Chemical Reviews;2012-03-16

5. Next-generation lithography for 22 and 16 nm technology nodes and beyond;Science China Information Sciences;2011-05

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