Study on various curvilinear data representations and their impact on mask and wafer manufacturing-Reference-Cited by-同舟云学术

Study on various curvilinear data representations and their impact on mask and wafer manufacturing

Published:2021-11-01 Issue:04 Volume:20 Page:
ISSN:2708-8340
Container-title:Journal of Micro/Nanopatterning, Materials, and Metrology
language:
Short-container-title:J. Micro/Nanopattern. Mats. Metro.

Author:

Choi Jin¹,Ryu Soo¹,Lee Sukho¹,Kim Minah¹,Park JoonSoo¹,Buck Peter²,Bork Ingo³,Durvasula Bhardwaj⁴,Gharat Sayalee⁴,Rao Nageswara⁴,Pai Ravi⁴,Koranne Sandeep²,Tritchkov Alexander²

Affiliation:

1. Samsung Electronics Co. Ltd., Hwasung

2. Siemens Digital Industries Software, Wilsonville, Oregon

3. Siemens Digital Industries Software, Fremont, California

4. Mentor – A Siemens Business Nalapad Brigade Centre, Unit No: 301 & 302, Bengaluru, Karnataka

Publisher

SPIE-Intl Soc Optical Eng

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1. Enhancing mask synthesis for curvilinear masks in full-chip extreme ultraviolet lithography;Journal of Micro/Nanopatterning, Materials, and Metrology;2023-12-20

2. Opportunities, challenges, and applications of native curvilinear data representation in post-tape-out flows;Photomask Technology 2023;2023-11-21

3. Curvilinear mask process correction: status quo and outlook;37th European Mask and Lithography Conference;2022-11-01

4. Curvilinear Mask Process Correction - status quo and outlook;2022 International Workshop on Advanced Patterning Solutions (IWAPS);2022-10-21

5. Status of curvilinear data format working group;Photomask Japan 2022: XXVIII Symposium on Photomask and Next-Generation Lithography Mask Technology;2022-09-16