Enhancing mask synthesis for curvilinear masks in full-chip extreme ultraviolet lithography-Reference-Cited by-同舟云学术

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Enhancing mask synthesis for curvilinear masks in full-chip extreme ultraviolet lithography

Published:2023-12-20 Issue:04 Volume:22 Page:
ISSN:2708-8340
Container-title:Journal of Micro/Nanopatterning, Materials, and Metrology
language:
Short-container-title:J. Micro/Nanopattern. Mats. Metro.

Author:

Hooker Kevin¹,Xiao Guangming¹,Tang Yu-Po²,Zhang Yunqiang³,Jeong Moongyu⁴,Valadez John¹,Lucas Kevin¹

Affiliation:

1. Synopsys Inc., Austin, Texas, United States

2. Synopsys Taiwan Co., Ltd., Hsinchu, Taiwan

3. Synopsys Inc., Mountain View, California, United States

4. Synopsys Korea Inc., Yongin-Si, Republic of Korea

Publisher

SPIE-Intl Soc Optical Eng

Subject

General Arts and Humanities

Reference16 articles.

1. Multi-beam mask writer MBM-1000

2. Trade-off between inverse lithography mask complexity and lithographic performance

3. Inverse lithography technology: 30 years from concept to practical, full-chip reality

4. Affordable and process window increasing full chip ILT masks

5. Enhancing fullchip ILT mask synthesis capability for IC manufacturability

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