Author:
Xiao Guangming,Irby Dave,Cecil Tom,Kim David,Ohara Shuichiro,Aburatani Isao
Cited by
6 articles.
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1. Enhancing mask synthesis for curvilinear masks in full-chip extreme ultraviolet lithography;Journal of Micro/Nanopatterning, Materials, and Metrology;2023-12-20
2. Curvilinear mask handling in OPC flow;Journal of Micro/Nanopatterning, Materials, and Metrology;2023-11-24
3. Curvilinear mask solutions for full-chip EUV lithography;Novel Patterning Technologies 2022;2022-05-25
4. Inverse lithography technology: 30 years from concept to practical, full-chip reality;Journal of Micro/Nanopatterning, Materials, and Metrology;2021-08-31
5. Computational lithography: Exhausting the resolution limits of 193-nm projection lithography systems;Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena;2011-11