Computational lithography: Exhausting the resolution limits of 193-nm projection lithography systems-Reference-Cited by-同舟云学术

Computational lithography: Exhausting the resolution limits of 193-nm projection lithography systems

Published:2011-11 Issue:6 Volume:29 Page:06FH04
ISSN:2166-2746
Container-title:Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena
language:en
Short-container-title:Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena

Author:

Melville David O. S.,Rosenbluth Alan E.,Waechter Andreas,Millstone Marc,Tirapu-Azpiroz Jaione,Tian Kehan,Lai Kafai,Inoue Tadanobu,Sakamoto Masaharu,Adam Kostas,Tritchkov Alexander

Publisher

American Vacuum Society

Subject

Materials Chemistry,Electrical and Electronic Engineering,Surfaces, Coatings and Films,Process Chemistry and Technology,Instrumentation,Electronic, Optical and Magnetic Materials

Link

http://avs.scitation.org/doi/pdf/10.1116/1.3662090

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