An effective lithography training module adapting semianalytical calculation approaches-Reference-Cited by-同舟云学术

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An effective lithography training module adapting semianalytical calculation approaches

Published:2021-07 Issue:11 Volume:29 Page:868-895
ISSN:1071-0922
Container-title:Journal of the Society for Information Display
language:en
Short-container-title:J Soc Inf Display

Author:

Cakmak Atilla Ozgur¹^ORCID,Colak Evrim²^ORCID,Awadelkarim Osama O.¹^ORCID

Affiliation:

1. Department of Engineering Science and Mechanics, The Center for Nanotechnology Education and Utilization The Pennsylvania State University State College Pennsylvania USA

2. Electrical and Electronics Engineering Department Ankara University Ankara Turkey

Funder

Division of Undergraduate Education

Publisher

Wiley

Subject

Electrical and Electronic Engineering,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Link

https://onlinelibrary.wiley.com/doi/pdf/10.1002/jsid.1067

Reference57 articles.

1. The ending of optical lithography and the prospects of its successors

2. Making lithography work for the 7-nm node and beyond in overlay accuracy, resolution, defect, and cost

3. Intel A new paradigm for Moore's law process and packaging: Intel 6 Pillars of Technology Innovation Accessed December 2020.

4. KLA‐Tencor Patterning simulation systems: Prolith Patterning Simulation|Chip Manufacturing|KLA (kla‐tencor.com) Accessed December 2020.

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