Rare resource supply crisis and solution technology for semiconductor manufacturing-Reference-Cited by-同舟云学术

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Rare resource supply crisis and solution technology for semiconductor manufacturing

Published:2016-03-15 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
language:
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Author:

Fukuda Hitomi,Hu Sophia,Yoo Youngsun,Takahisa Kenji,Enami Tatsuo

Publisher

SPIE

Reference3 articles.

1. Advanced Excimer Laser Technologies Enable Green Semiconductor Manufacturing;Fukuda,2014

2. Extending green technology innovations to enable greener fabs;Takahisa,2015

3. 120W ArF Laser with high wavelength stability and efficiency for the next generation multiple-patterning immersion lithography;Ohta,2015

Cited by 3 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. The ArF laser for the next generation multiple-patterning immersion lithography supporting green operations and leading edge processes;SPIE Proceedings;2017-03-24

2. Excimer laser gas usage reduction technology for semiconductor manufacturing;SPIE Proceedings;2017-03-17

3. Development of the next-generation ArF excimer laser with ultra-narrow stable spectral bandwidth for multiple patterning immersion lithography;SPIE Proceedings;2017-03-17

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