Development of the next-generation ArF excimer laser with ultra-narrow stable spectral bandwidth for multiple patterning immersion lithography-Reference-Cited by-同舟云学术

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Development of the next-generation ArF excimer laser with ultra-narrow stable spectral bandwidth for multiple patterning immersion lithography

Published:2017-03-17 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
language:
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Author:

Furusato Hiroshi¹,Kumazaki Takahito¹,Ohta Takeshi¹,Tsushima Hiroaki¹,Kurosu Akihiko¹,Matsunaga Takashi¹,Mizoguchi Hakaru¹

Affiliation:

1. Gigaphoton Inc. (Japan)

Publisher

SPIE

Reference4 articles.

1. Extending green technology innovations to enable greener fabs;Takahisa,2015

2. The next generation ArF Excimer Laser for multiple-patterning immersion lithography with helium free operation;Miyamoto,2016

3. Rare resource supply crisis and solution technology for semiconductor manufacturing;Fukuda,2016

4. Diffraction Grating Handbook;Palmer,2014

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