Excimer laser gas usage reduction technology for semiconductor manufacturing-Reference-Cited by-同舟云学术

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Excimer laser gas usage reduction technology for semiconductor manufacturing

Published:2017-03-17 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
language:
Short-container-title:

Author:

Yashiro Masanori¹,Oouchi Takuma¹,Tsushima Hiroaki¹,Kurosu Akihiko¹,Ohta Takeshi¹,Matsunaga Takashi¹,Mizoguchi Hakaru¹

Affiliation:

1. Gigaphoton Inc. (Japan)

Publisher

SPIE

Reference3 articles.

1. The ArF laser for the next-generation multiple-patterning immersion lithography supporting green operations;Ishida,2016

2. Rare resource supply crisis and solution technology for semiconductor manufacturing;Fukuda,2016

3. Performance Improvement of an ArF Excimer Laser for Microlithography by Means of Gaseous Impurity Control;Sumitani,2005

Cited by 1 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Nd:YAG infrared laser as a viable alternative to excimer laser: YBCO case study;Scientific Reports;2023-03-08

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