Author:
Su Bo,Oshana Ramiel,Menaker Mina,Barak Yogev,Shi Xuelong
Cited by
18 articles.
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1. Tilted beam scanning electron microscopy, 3-D metrology for microelectronics industry;Journal of Micro/Nanolithography, MEMS, and MOEMS;2019-08-19
2. Tilted beam SEM, 3D metrology for industry;Metrology, Inspection, and Process Control for Microlithography XXXIII;2019-03-26
3. Three-Dimensional (3D) Nanometrology Based on Scanning Electron Microscope (SEM) Stereophotogrammetry;Microscopy and Microanalysis;2017-09-18
4. Addressing FinFET metrology challenges in 1× node using tilt-beam critical dimension scanning electron microscope;Journal of Micro/Nanolithography, MEMS, and MOEMS;2014-10-01
5. Addressing FinFET metrology challenges in 1X node using tilt-beam CD-SEM;Metrology, Inspection, and Process Control for Microlithography XXVIII;2014-04-02