Imbalance aware lithography hotspot detection: a deep learning approach

Author:

Yang Haoyu1,Luo Luyang1,Su Jing2,Lin Chenxi2,Yu Bei1

Affiliation:

1. The Chinese Univ. of Hong Kong (Hong Kong, China)

2. ASML Brion (United States)

Publisher

SPIE

Reference39 articles.

1. Hotspot detection on Post-OPC layout using full chip simulation based verification tool: A case study with aerial image simulation;Kim,2003

2. Automated full-chip hotspot detection and removal flow for interconnect layers of cell-based designs;Roseboom,2007

3. Accurate process-hotspot detection using critical design rule extraction;Yu,2012

4. A Fuzzy-Matching Model With Grid Reduction for Lithography Hotspot Detection

5. High Performance Lithography Hotspot Detection With Successively Refined Pattern Identifications and Machine Learning

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