Projection optics for EUVL micro-field exposure tools with 0.5 NA
Author:
Affiliation:
1. Zygo Corp. (United States)
2. SEMATECH Inc. (United States)
3. Lawrence Berkeley National Lab. (United States)
4. Hyperion Development LLC (United States)
5. Lawrence Livermore National Lab. (United States)
6. Spiller X-ray Optics (United States)
Publisher
SPIE
Reference23 articles.
1. Projection optics for extreme ultraviolet lithography (EUVL) microfield exposure tools (METs) with a numerical aperture of 0.5;Glatzel,2013
2. Cramming more components onto integrated circuits, Reprinted from Electronics, volume 38, number 8, April 19, 1965, pp.114 ff.
3. Contamination and degradation of 157-nm stepper optical components: field experience at International SEMATECH;Meute,2002
4. Demonstration of sub-45nm features using azimuthal polarization on a 1.30NA immersion microstepper;Piscani,2007
5. The EUV resist test center at SEMATECH-North;Lowack,2006
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