Projection optics for EUVL micro-field exposure tools with 0.5 NA

Author:

Glatzel Holger1,Ashworth Dominic2,Bajuk Dan1,Bjork Matt1,Bremer Mark1,Cordier Mark1,Cummings Kevin2,Girard Luc1,Goldstein Michael2,Gullikson Eric3,Hardy Samuel1,Hudyma Russ4,Kennon James1,Kestner Robert1,Marchetti Lou1,Nouri Keyvan1,Naulleau Patrick3,Pierce Daniel1,Soufli Regina5,Spiller Eberhard6,Verma Yogesh1

Affiliation:

1. Zygo Corp. (United States)

2. SEMATECH Inc. (United States)

3. Lawrence Berkeley National Lab. (United States)

4. Hyperion Development LLC (United States)

5. Lawrence Livermore National Lab. (United States)

6. Spiller X-ray Optics (United States)

Publisher

SPIE

Reference23 articles.

1. Projection optics for extreme ultraviolet lithography (EUVL) microfield exposure tools (METs) with a numerical aperture of 0.5;Glatzel,2013

2. Cramming more components onto integrated circuits, Reprinted from Electronics, volume 38, number 8, April 19, 1965, pp.114 ff.

3. Contamination and degradation of 157-nm stepper optical components: field experience at International SEMATECH;Meute,2002

4. Demonstration of sub-45nm features using azimuthal polarization on a 1.30NA immersion microstepper;Piscani,2007

5. The EUV resist test center at SEMATECH-North;Lowack,2006

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