Taming the final frontier of optical lithography: design for sub-resolution patterning-Reference-Cited by-同舟云学术

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Taming the final frontier of optical lithography: design for sub-resolution patterning

Published:2010-03-11 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
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Author:

Liebmann Lars W.,Kye Jongwook,Kim Byung-Sung,Yuan Lei,Geronimi Jean-Pierre

Publisher

SPIE

Cited by 11 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Inverse lithography OPC correction with multiple patterning and etch awareness;Optical Microlithography XXXI;2018-03-20

2. Enhanced OPC recipe coverage and early hotspot detection through automated layout generation and analysis;SPIE Proceedings;2017-03-17

3. Combining mask and OPC process verification for improved wafer patterning and yield;SPIE Proceedings;2016-10-25

4. Meniscus-Mask Lithography for Fabrication of Narrow Nanowires;Nano Letters;2015-04-07

5. Self-aligned double-patterning layout decomposition for two-dimensional random metals for sub-10-nm node design;Journal of Micro/Nanolithography, MEMS, and MOEMS;2014-12-04

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