Sub-40-nm half-pitch double patterning with resist freezing process-Reference-Cited by-同舟云学术

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Sub-40-nm half-pitch double patterning with resist freezing process

Published:2008-03-14 Issue: Volume: Page:
ISSN:0277-786X
Container-title:Advances in Resist Materials and Processing Technology XXV
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Author:

Hori Masafumi,Nagai Tomoki,Nakamura Atsushi,Abe Takayoshi,Wakamatsu Gouji,Kakizawa Tomohiro,Anno Yuusuke,Sugiura Makoto,Kusumoto Shiro,Yamaguchi Yoshikazu,Shimokawa Tsutomu

Publisher

SPIE

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