Chemically amplified DUV photoresists using a new class of photoacid-generating compounds
Author:
Pawlowski Georg1,
Dammel Ralph R.1,
Lindley Charlet R.2,
Merrem Hans-Joachim1,
Roeschert Heinz2,
Lingnau Juergen2
Affiliation:
1. Hoechst AG (USA)
2. Hoechst AG (Germany)
Cited by
26 articles.
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