Author:
Tanagi Hiroyuki,Tanaka Hiroyasu,Hayakawa Shoichi,Furukawa Kikuo,Yamamoto Hiroki,Kozawa Takahiro
Reference33 articles.
1. Molecular Challenges of Immersion and Extreme Ultraviolet (EUV) Resists
2. Ushida, K., SEMI Technology Symposium. Session 3, 3–13 (2002).
3. Shu-Hao, D., Hsien, W., Huang, C., Wu, W., and Shin, C., Proc. SPIE 8325, M1–10 (2012).
4. Material Development for ArF Immersion Extension towards Sub-20nm Node
5. Yaegashi, H., Oyama, K., Hara, A., Natori, S., Yamauchi, S., and Yamato, M., Proc. SPIE, 8682 8682041–7 (2013).
Cited by
1 articles.
订阅此论文施引文献
订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Recent EUV Resists toward High Volume Manufacturing;Journal of Photopolymer Science and Technology;2014