100-nm OPC mask patterning using raster-scan 50-kV pattern generation technology-Reference-Cited by-同舟云学术

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100-nm OPC mask patterning using raster-scan 50-kV pattern generation technology

Published:2002-03-11 Issue: Volume: Page:
ISSN:0277-786X
Container-title:21st Annual BACUS Symposium on Photomask Technology
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Author:

Abboud Frank E.,Baik Ki-Ho,Chakarian Varoujan,Cole Damon M.,Daniel Jay P.,Dean Robert L.,Gesley Mark A.,Naber Robert J.,Newman Thomas H.,Raymond III Frederick,Trost David,Wiltse Mark,DeVore William

Publisher

SPIE

Cited by 7 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Mask data processing in the era of multibeam writers;SPIE Proceedings;2014-10-21

2. Comparative study between REAP 200 and FEP171 CAR with 50-kV raster e-beam system for sub-100-nm technology;SPIE Proceedings;2003-08-26

3. Mask process proximity correction for next-generation mask fabrication;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;2003

4. Raster Shaped Beam Pattern Generation for 70 nm Photomask Production;SPIE Proceedings;2002-12-24

5. Raster scan patterning solution for 100- and 70-nm OPC masks;SPIE Proceedings;2002-07-31

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