Raster Shaped Beam Pattern Generation for 70 nm Photomask Production-Reference-Cited by-同舟云学术

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Raster Shaped Beam Pattern Generation for 70 nm Photomask Production

Published:2002-12-24 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
language:
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Author:

Newman Thomas H.,Finklestein Ira,Kao Huei-Mei,Krishnaswami Sriram,Long Darryn,Lozes Richard L.,Pearce-Percy Henry T.,Sagle Allan L.,Varner Jeffrey K.,Winter Stacey,Gesley Mark A.,Abboud Frank E.

Publisher

SPIE

Cited by 3 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Requirements of data technology for EUV photomask;Photomask Technology 2019;2019-09-26

2. Full-chip lithography simulation and design analysis: how OPC is changing IC design;SPIE Proceedings;2005-05-06

3. Nanoimprint lithography: the path toward high-tech, low-cost devices (Keynote Paper);SPIE Proceedings;2005-05-06

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