Performance of EBeyeM for EUV mask inspection-Reference-Cited by-同舟云学术

登录注册会员服务联系我们

Performance of EBeyeM for EUV mask inspection

Published:2011-10-06 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
language:
Short-container-title:

Author:

Yamaguchi Shinji,Naka Masato,Hirano Takashi,Itoh Masamitsu,Kadowaki Motoki,Koike Tooru,Yamazaki Yuichiro,Terao Kenji,Hatakeyama Masahiro,Watanabe Kenji,Sobukawa Hiroshi,Murakami Takeshi,Karimata Tsutomu,Tsukamoto Kiwamu,Hayashi Takehide,Tajima Ryo,Kimura Norio,Hayashi Naoya

Publisher

SPIE

Cited by 30 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. EUV multilayer defect characterization via cycle-consistent learning;Optics Express;2020-06-05

2. EUV mask infrastructure and actinic pattern mask inspection;Extreme Ultraviolet (EUV) Lithography XI;2020-03-23

3. DUV inspection beyond optical resolution limit for EUV mask of hp 1X nm;Photomask Technology;2017-10-16

4. Enhanced defect detection capability using learning system for extreme ultraviolet lithography mask inspection tool with projection electron microscope optics;Journal of Micro/Nanolithography, MEMS, and MOEMS;2016-06-24

5. Recent results from extreme ultraviolet lithography patterned mask inspection for 11 nm half-pitch generation using projection electron microscope system;SPIE Proceedings;2016-05-10

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370

www.globalauthorid.com

TOP