Abbe-PCA-SMO: microlithography source and mask optimization based on Abbe-PCA
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SPIE
Cited by 7 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. 光源掩模联合优化技术研究;Laser & Optoelectronics Progress;2022
2. Multi-Parameter Joint Optimization for Lithography Based on Photoresist Topography Model;Acta Optica Sinica;2020
3. Separation of variables based method for fast calculation of imaging system in lithographic tools;Tenth International Conference on Information Optics and Photonics;2018-11-15
4. Topology optimization for optical microlithography with partially coherent illumination;International Journal for Numerical Methods in Engineering;2016-06-16
5. Efficient three-dimensional resist profile-driven source mask optimization optical proximity correction based on Abbe-principal component analysis and Sylvester equation;Journal of Micro/Nanolithography, MEMS, and MOEMS;2014-12-22
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