Efficient three-dimensional resist profile-driven source mask optimization optical proximity correction based on Abbe-principal component analysis and Sylvester equation-Reference-Cited by-同舟云学术

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Efficient three-dimensional resist profile-driven source mask optimization optical proximity correction based on Abbe-principal component analysis and Sylvester equation

Published:2014-12-22 Issue:1 Volume:14 Page:011006
ISSN:1932-5150
Container-title:Journal of Micro/Nanolithography, MEMS, and MOEMS
language:en
Short-container-title:J. Micro/Nanolith. MEMS MOEMS

Author:

Lin Pei-Chun,Yu Chun-Chang,Chen Charlie Chung-Ping

Publisher

SPIE-Intl Soc Optical Eng

Subject

Electrical and Electronic Engineering,Mechanical Engineering,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference11 articles.

1. Abbe-PCA-SMO: microlithography source and mask optimization based on Abbe-PCA

2. Reduction of photoresist standing-wave effects by post-exposure bake

3. A practical method for numerical evaluation of solutions of partial differential equations of the heat-conduction type

Cited by 1 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. A New Varying-Parameter Recurrent Neural-Network for Online Solution of Time-Varying Sylvester Equation;IEEE Transactions on Cybernetics;2018-11

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