Reduction of photoresist standing-wave effects by post-exposure bake-Reference-Cited by-同舟云学术

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Reduction of photoresist standing-wave effects by post-exposure bake

Published:1975-07 Issue:7 Volume:22 Page:464-466
ISSN:0018-9383
Container-title:IEEE Transactions on Electron Devices
language:
Short-container-title:IEEE Trans. Electron Devices

Author:

Walker E.J.

Publisher

Institute of Electrical and Electronics Engineers (IEEE)

Subject

Electrical and Electronic Engineering,Electronic, Optical and Magnetic Materials

Link

http://xplorestaging.ieee.org/ielx5/16/31739/01477997.pdf?arnumber=1477997

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