Author:
Eilert Andre,Finken Michael,Buergel Christian,Herrmann Mark,Hellriegel Ronald,Nestler Rico,Loeffler Oliver,Huebenthal Frank,Buettner Rico,Steidel Katja
Reference8 articles.
1. Mask manufacturing mix-and-match in frontend wafer processing;Frangen,2004
2. Requirements of the e-beam shot quality for mask patterning of the sub-1X device;Park,2016
3. Resolution and total blur: Correlation and focus dependencies in e-beam lithography
4. Projection Printing Characterization;Bossung,1977
5. Determination of best focus and optimum dose for variable shaped e-beam systems by applying the isofocal dose method
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