Determination of best focus and optimum dose for variable shaped e-beam systems by applying the isofocal dose method-Reference-Cited by-同舟云学术

Determination of best focus and optimum dose for variable shaped e-beam systems by applying the isofocal dose method

Published:2008-05 Issue:5-6 Volume:85 Page:778-781
ISSN:0167-9317
Container-title:Microelectronic Engineering
language:en
Short-container-title:Microelectronic Engineering

Author:

Keil Katja,Choi Kang-Hoon,Hohle Christoph,Kretz Johannes,Lutz Tarek,Bettin Lutz,Boettcher Monika,Hahmann Peter,Kliem Karl-Heinz,Schnabel Bernd,Irmscher Mathias,Sailer Holger

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Surfaces, Coatings and Films,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference4 articles.

1. High resolution variable-shaped beam direct write

2. Projection Printing Characterization

3. Electron-beam lithography simulation for maskmaking: IV. Effect of resist contrast on isofocal dose

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