Free-electron laser emission architecture impact on extreme ultraviolet lithography-Reference-Cited by-同舟云学术

Free-electron laser emission architecture impact on extreme ultraviolet lithography

Published:2017-10-30 Issue:04 Volume:16 Page:1
ISSN:1932-5150
Container-title:Journal of Micro/Nanolithography, MEMS, and MOEMS
language:
Short-container-title:J. Micro/Nanolith. MEMS MOEMS

Author:

Hosler Erik R.¹,Wood Obert R.¹,Barletta William A.²

Affiliation:

1. GLOBALFOUNDRIES, Malta, New York

2. Massachusetts Institute of Technology, Department of Physics, Cambridge, Massachusetts

Publisher

SPIE-Intl Soc Optical Eng

Subject

Electrical and Electronic Engineering,Mechanical Engineering,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

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