Focused-ion-beam repair of phase-shift photomasks-Reference-Cited by-同舟云学术

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Focused-ion-beam repair of phase-shift photomasks

Published:1992-07-09 Issue: Volume: Page:
ISSN:0277-786X
Container-title:Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing II
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Author:

Harriott Lloyd R.,Garofalo Joseph G.,Kostelak Robert L.

Publisher

SPIE

Cited by 13 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Lithography and Other Patterning Techniques for Future Electronics;Proceedings of the IEEE;2008-02

2. Focused ion beam biased repair of conventional and phase shift masks;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;1996-11

3. Focused ion beam machining and deposition for nanofabrication;Vacuum;1996-05

4. Focused ion beam preparation of inclined planes in semiconductor materials;Vacuum;1996-05

5. Multiple-layer blank structure for phase-shifting mask fabrication;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;1996-01

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