Lithography and Other Patterning Techniques for Future Electronics-Reference-Cited by-同舟云学术

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Lithography and Other Patterning Techniques for Future Electronics

Published:2008-02 Issue:2 Volume:96 Page:248-270
ISSN:0018-9219
Container-title:Proceedings of the IEEE
language:
Short-container-title:Proc. IEEE

Author:

Pease R.F.,Chou S.Y.

Publisher

Institute of Electrical and Electronics Engineers (IEEE)

Subject

Electrical and Electronic Engineering

Link

http://xplorestaging.ieee.org/ielx5/5/4432785/04432794.pdf?arnumber=4432794

Cited by 298 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Influence of Chemical Structures on E-Beam Lithography Performance of Polysilsesquioxanes;ACS Applied Materials & Interfaces;2024-09-12

2. Selective and Sensitive Detection of Ammonia at Room Temperature by the WS₂-PANI Nanocomposite on a Flexible Paper-Based Sensor with Cost-Effective Chemically Expanded Graphite Ink Electrodes;ACS Applied Electronic Materials;2024-08-23

3. Designed wrinkles for optical encryption and flexible integrated circuit carrier board;Nature Communications;2024-07-04

4. Creation and Characterization of Nanoscale Ribbons on MoS₂ by Atomic Force Microscope Nanolithography;ECS Journal of Solid State Science and Technology;2024-07-01

5. On-Wafer FinFET-Based 3-D E-Beam Detector Cube for In Situ Monitoring of Advanced Lithography Processes Beyond 5 nm;IEEE Transactions on Electron Devices;2024-06

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