Development of Xe- and Sn-fueled high-power Z-pinch EUV source aiming at HVM-Reference-Cited by-同舟云学术

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Development of Xe- and Sn-fueled high-power Z-pinch EUV source aiming at HVM

Published:2006-03-10 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
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Author:

Teramoto Yusuke,Niimi Gohta,Yamatani Daiki,Joshima Yuki,Bessho Kazunori,Shirai Takahiro,Takemura Tetsu,Yokota Toshio,Yabuta Hironobu,Paul Khokan C.,Kabuki Kiyoyuki,Miyauchi Koji,Ikeuchi Mitsuru,Hotta Kazuaki,Yoshioka Masaki,Sato Hiroto

Publisher

SPIE

Cited by 12 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Plasma dynamics in the initial stage of a laser-triggered discharge-plasma;Journal of Applied Physics;2018-12-07

2. High efficiency structured EUV multilayer mirror for spectral filtering of long wavelengths;OPT EXPRESS;2014

3. Spectral purity enhancement for the EUV lithography systems by suppressing UV reflection from multilayers;SPIE Proceedings;2014-04-17

4. Extreme ultraviolet lithography and three dimensional integrated circuit—A review;Applied Physics Reviews;2014-03

5. Next-generation lithography for 22 and 16 nm technology nodes and beyond;Science China Information Sciences;2011-05

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