Extreme ultraviolet lithography and three dimensional integrated circuit—A review
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.4863412
Reference100 articles.
1. Absorber stack with transparent conductive oxide layer for extreme ultraviolet lithography
2. Improved imaging properties of thin attenuated phase shift masks for extreme ultraviolet lithography
3. Soft x-ray projection lithography using an x-ray reduction camera
4. Soft x-ray reduction lithography using multilayer mirrors
5. Reduction imaging at 14 nm using multilayer-coated optics: Printing of features smaller than 0.1 μm
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