Scatterometry for advanced process control in semiconductor device manufacturing-Reference-Cited by-同舟云学术

Scatterometry for advanced process control in semiconductor device manufacturing

Published:2017-06-13 Issue: Volume: Page:
ISSN:
Container-title:Fifth International Conference on Optical and Photonics Engineering
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Author:

Schmets-Schagen Jolanda,Koolen Armand,van Loon Olaf,de Gersem Gudrun,Klandermans Pieter,Bakker Eric,den Boef Arie,Cramer Hugo,Petra Stefan,Onne Fagginger Auer Bastiaan

Publisher

SPIE

Reference13 articles.

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3. EUV lithography at chipmakers has started: performance validation of ASML's NXE:3100

4. Overview of 3D NAND Flash and progress of vertical gate (VG) architecture

5. A 4F2-cross-point phase change memory using nano-crystalline doped GeSbTe material

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