Author:
Liu Chi-Chun,Mignot Yann,Chi Cheng,Lai Kafai,Sha Jing,Guo Jing,Glodde Martin,Farrell Richard,Felix Nelson,Hetzer David,Metz Andrew,Corliss Daniel,Muramatsu Makoto,Ido Yasuyuki
Reference7 articles.
1. Demonstrating production quality multiple exposure patterning aware routing for the 10NM node
2. SAQP and EUV block patterning of BEOL metal layers on IMEC's iN7 platform;Bekaert,2017
3. Towards electrical testable SOI devices using Directed Self-Assembly for fin formation;Liu,2014
4. Graphoepitaxial and chemoepitaxial methods for creating line-space patterns at 33nm pitch: comparison to a HVM process;Millward,2015
5. Defect mitigation and root cause studies in 14 nm half-pitch chemo-epitaxy directed self-assembly LiNe flow
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