Demonstrating production quality multiple exposure patterning aware routing for the 10NM node
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Reference7 articles.
1. Detailed routing with advanced flexibility and in compliance with self-aligned double patterning constraints Fumiharu Nakajima, Chikaaki Kodama, Hirotaka Ichikawa, Koichi Nakayama, Shigeki Nojima, Toshiya Kotani, Shoji Mimotogi, Shinji Miyamoto; Proc. SPIE. 8684, Design for Manufacturability through Design-Process Integration VII 86840A (March 29, 2013) doi: 10.1117/12.2010644
2. Self-aligned double patterning compliant routing with in-design physical verification flow Jhih-Rong Gao, Harshdeep Jawandha, Prasad Atkar, Atul Walimbe, Bikram Baidya, Olivier Rizzo, David Z. Pan; Proc. SPIE. 8684, Design for Manufacturability through Design-Process Integration VII 868408 (March 29, 2013) doi: 10.1117/12.2013245
3. Self-aligned double patterning (SADP) compliant design flow Yuangsheng Ma, Jason Sweis, Hidekazu Yoshida, Yan Wang, Jongwook Kye, Harry J. Levinson; Proc. SPIE. 8327, Design for Manufacturability through Design-Process Integration VI 832706 (March 29, 2012) doi: 10.1117/12.917775
4. Design compliance for spacer is dielectric (SID) patterning Gerard Luk-Pat, Alex Miloslavsky, Ben Painter, Li Lin, Peter De Bisschop, Kevin Lucas; Proc. SPIE. 8326, Optical Microlithography XXV 83260D (February 21, 2012) doi: 10.1117/12.917986
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