<title>Self-aligned double patterning (SADP) compliant design flow

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Self-aligned double patterning (SADP) compliant design flow

Published:2012-03-29 Issue: Volume: Page:
ISSN:0277-786X
Container-title:Design for Manufacturability through Design-Process Integration VI
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Author:

Ma Yuangsheng,Sweis Jason,Yoshida Hidekazu,Wang Yan,Kye Jongwook,Levinson Harry J.

Publisher

SPIE

Cited by 15 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Process window improvement for fin cut layer in self-aligned double-patterning process based on backscattered electron imaging;Journal of Micro/Nanopatterning, Materials, and Metrology;2022-11-04

2. SP&R: SMT-Based Simultaneous Place-and-Route for Standard Cell Synthesis of Advanced Nodes;IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems;2021-10

3. Multirow Complementary-FET (CFET) Standard Cell Synthesis Framework Using Satisfiability Modulo Theories (SMTs);IEEE Journal on Exploratory Solid-State Computational Devices and Circuits;2021-06

4. Complementary-FET (CFET) Standard Cell Synthesis Framework for Design and System Technology Co-Optimization Using SMT;IEEE Transactions on Very Large Scale Integration (VLSI) Systems;2021-06

5. Grid-Based Framework for Routability Analysis and Diagnosis With Conditional Design Rules;IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems;2020-12

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