Self-aligned double patterning (SADP) compliant design flow
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SPIE
Cited by 15 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Process window improvement for fin cut layer in self-aligned double-patterning process based on backscattered electron imaging;Journal of Micro/Nanopatterning, Materials, and Metrology;2022-11-04
2. SP&R: SMT-Based Simultaneous Place-and-Route for Standard Cell Synthesis of Advanced Nodes;IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems;2021-10
3. Multirow Complementary-FET (CFET) Standard Cell Synthesis Framework Using Satisfiability Modulo Theories (SMTs);IEEE Journal on Exploratory Solid-State Computational Devices and Circuits;2021-06
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5. Grid-Based Framework for Routability Analysis and Diagnosis With Conditional Design Rules;IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems;2020-12
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