Design method and algorithms for directed self-assembly aware via layout decomposition in sub-7 nm circuits-Reference-Cited by-同舟云学术

Design method and algorithms for directed self-assembly aware via layout decomposition in sub-7 nm circuits

Published:2016-11-07 Issue:4 Volume:15 Page:043506
ISSN:1932-5150
Container-title:Journal of Micro/Nanolithography, MEMS, and MOEMS
language:en
Short-container-title:J. Micro/Nanolith. MEMS MOEMS

Author:

Karageorgos Ioannis¹,Ryckaert Julien²,Gronheid Roel²,Tung Maryann C.³,Wong H.-S. Philip³,Karageorgos Evangelos⁴,Croes Kris²,Bekaert Joost²,Vandenberghe Geert²,Stucchi Michele²,Dehaene Wim¹

Affiliation:

1. imec, Kapeldreef 75, Leuven B-3001, BelgiumbKU Leuven, Department of Electrical Engineering (ESAT), Kasteelpark Arenberg 10, Leuven B-3001, Belgium

2. imec, Kapeldreef 75, Leuven B-3001, Belgium

3. Stanford University, Department of Electrical Engineering, 420 Via Palou, Stanford, California 94305, United States

4. University of Athens, Department of Informatics and Telecommunications, Panepistimiopolis, Athens 15784, Greece

Publisher

SPIE-Intl Soc Optical Eng

Subject

Electrical and Electronic Engineering,Mechanical Engineering,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference35 articles.

1. Modeling of hot carrier degradation using a spherical harmonics expansion of the bipolar Boltzmann transport equation

2. Physics of block copolymers from bulk to thin films

3. Enabling nanotechnology with self assembled block copolymer patterns

4. Directed Self-Assembly of Block Copolymers for Nanolithography: Fabrication of Isolated Features and Essential Integrated Circuit Geometries

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