Numerical and experimental study of near-field scanning optical lithography using nanoscale bowtie apertures with ultrasmall gap size-Reference-Cited by-同舟云学术

Numerical and experimental study of near-field scanning optical lithography using nanoscale bowtie apertures with ultrasmall gap size

Published:2016-09-29 Issue:3 Volume:15 Page:031611
ISSN:1932-5150
Container-title:Journal of Micro/Nanolithography, MEMS, and MOEMS
language:en
Short-container-title:J. Micro/Nanolith. MEMS MOEMS

Author:

Ding Li¹,Qin Jin¹,Chen Yang²,Wang Liang¹

Affiliation:

1. University of Science and Technology of China, Anhui Key Laboratory of Optoelectronic Science and Technology, Department of Optics and Optical Engineering, No. 96, JinZhai Road, Baohe District, Hefei, Anhui 230026, China

2. University of Science and Technology of China, Micro and Nano Engineering Lab, Department of Precision Machinery and Precision Instrumentation, No. 96, JinZhai Road, Baohe District, Hefei, Anhui 230026, China

Publisher

SPIE-Intl Soc Optical Eng

Subject

Electrical and Electronic Engineering,Mechanical Engineering,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference18 articles.

1. Low-scattering surface plasmon refraction with isotropic materials

2. Surface plasmon resonant interference nanolithography technique

3. Protected nanoaperture based on multi-excitation of the localized surface plasmon between a ridge nanoaperture and metal nanoparticle

4. Advanced Materials

5. Formation of Bandgap and Subbands in Graphene Nanomeshes with Sub-10 nm Ribbon Width Fabricated via Nanoimprint Lithography

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