Metrology of 50nm HP wire-grid polarizer: a SEM-scatterometry comparison

Author:

Zhu Ruichao,Munoz Alexander,Brueck S. R. J.,Singhanl Shrawan,Sreenivasan S. V.

Publisher

SPIE

Reference18 articles.

1. Linewidth measurement of gratings on photomasks: a simple technique

2. Scatterometry for Semiconductor Metrology;Raymond,2001

3. Scatterometry measurement precision and accuracy below 70 nm

4. Fundamental limits of optical critical dimension metrology: a simulation study;Silver,2007

5. Extending scatterometry to the measurements of sub 40 nm features, double patterning structures, and 3D OPC patterns;Kritsun,2008

Cited by 3 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. Nanoscale limits of angular optical scatterometry;AIP Advances;2020-01-01

2. Optical angular scatterometry: In-line metrology approach for roll-to-roll and nanoimprint fabrication;Journal of Vacuum Science & Technology B;2019-09

3. Scatterometry for nanoimprint lithography;Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena;2016-11

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