Author:
Zhu Ruichao,Munoz Alexander,Brueck S. R. J.,Singhanl Shrawan,Sreenivasan S. V.
Reference18 articles.
1. Linewidth measurement of gratings on photomasks: a simple technique
2. Scatterometry for Semiconductor Metrology;Raymond,2001
3. Scatterometry measurement precision and accuracy below 70 nm
4. Fundamental limits of optical critical dimension metrology: a simulation study;Silver,2007
5. Extending scatterometry to the measurements of sub 40 nm features, double patterning structures, and 3D OPC patterns;Kritsun,2008
Cited by
3 articles.
订阅此论文施引文献
订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Nanoscale limits of angular optical scatterometry;AIP Advances;2020-01-01
2. Optical angular scatterometry: In-line metrology approach for roll-to-roll and nanoimprint fabrication;Journal of Vacuum Science & Technology B;2019-09
3. Scatterometry for nanoimprint lithography;Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena;2016-11