Towards the optical inspection sensitivity optimization of EUV masks and EUVL-exposed wafers-Reference-Cited by-同舟云学术

Towards the optical inspection sensitivity optimization of EUV masks and EUVL-exposed wafers

Published:2012-04-16 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
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Author:

Okoroanyanwu U.¹,Heumann J.²,Zhu X.³,Clifford C. H.³,Jiang F.³,Mangat P.³,Ghaskadavi R.⁴,Mohn E.²,Moses R.²,Wood O.³,Rolff H.²,Schedel T.²,Cantrell R.²,Nesladek P.²,LiCausi N.³,Cai X.³,Taylor W.³,Schefske J.³,Bender M.²,Schmidt N.⁵

Affiliation:

1. GLOBALFOUNDRIES Inc. (Germany)

2. Advanced Mask Technology Ctr. GmbH Co. KG (Germany)

3. GLOBALFOUNDRIES Inc. (United States)

4. KLA-Tencor Corp. (United States)

5. KLA-Tencor Germany (Germany)

Publisher

SPIE

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