Extending green technology innovations to enable greener fabs-Reference-Cited by-同舟云学术

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Extending green technology innovations to enable greener fabs

Published:2015-03-18 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
language:
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Author:

Takahisa Kenji,Yoo Young Sun,Fukuda Hitomi,Minegishi Yuji,Enami Tatsuo

Publisher

SPIE

Reference3 articles.

1. GT40A: durable 45-W ArF injection-lock laser light source for dry/immersion lithography;Tanaka,2006

2. Advanced Excimer Laser Technologies Enable Green Semiconductor Manufacturing;Fukuda,2014

3. Advanced Excimer Laser Technologies Enable Green Semiconductor Manufacturing;Young Sun,2014

Cited by 4 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Next-generation ArF Laser technologies for multiple-patterning immersion lithography supporting leading edge processes;Optical Microlithography XXXI;2018-03-20

2. The ArF laser for the next generation multiple-patterning immersion lithography supporting green operations and leading edge processes;SPIE Proceedings;2017-03-24

3. Development of the next-generation ArF excimer laser with ultra-narrow stable spectral bandwidth for multiple patterning immersion lithography;SPIE Proceedings;2017-03-17

4. The next-generation ArF excimer laser for multiple-patterning immersion lithography with helium free operation;SPIE Proceedings;2016-03-15

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