Next-generation ArF Laser technologies for multiple-patterning immersion lithography supporting leading edge processes-Reference-Cited by-同舟云学术

Next-generation ArF Laser technologies for multiple-patterning immersion lithography supporting leading edge processes

Published:2018-03-20 Issue: Volume: Page:
ISSN:
Container-title:Optical Microlithography XXXI
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Author:

Miyamoto Hirotaka,Furusato Hiroshi,Ishida Keisuke,Tsushima Hiroaki,Kurosu Akihiko,Tanaka Hiroshi,Ohta Takeshi,Bushida Satoru,Saitou Takashi,Mizoguchi Hakaru

Publisher

SPIE

Reference5 articles.

1. Advanced excimer laser technologies enable green semiconductor manufacturing;Fukuda,2014

2. Extending green technology innovations to enable greener fabs;Takahisa,2015

3. The ArF laser for the next-generation multiple-patterning immersion lithography supporting green operations;Ishida,2016

4. The next-generation ArF excimer laser for multiple-patterning immersion lithography with helium free operation;Miyamoto,2016

5. The ArF Laser for the next generation multiple-patterning immersion lithography supporting green operations and leading edge processes;Miyamoto,2017

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2. Numerical and Experimental Analysis of Multi-Scale Patterning by Reflective Plasmonic Imaging Lithography;SSRN Electronic Journal;2022

3. Excimer Lasers for Lithography and Annealing;Handbook of Laser Micro- and Nano-Engineering;2021

4. Excimer Lasers for Lithography and Annealing;Handbook of Laser Micro- and Nano-Engineering;2021