Studying secondary electron behavior in EUV resists using experimentation and modeling-Reference-Cited by-同舟云学术

Studying secondary electron behavior in EUV resists using experimentation and modeling

Published:2015-03-16 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
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Author:

Narasimhan Amrit,Grzeskowiak Steven,Srivats Bharath,Herbol Henry,Wisehart Liam,Kelly Chris,Earley William,Ocola Leonidas E.,Neisser Mark,Denbeaux Gregory,Brainard Robert L.

Publisher

SPIE

Reference16 articles.

1. Secondary Electrons in EUV Lithography

2. Secondary Electrons in EUV Lithography

3. Electron-matter interactions in x-ray and electron beam lithography;Ocola,1996

4. Annalen der Physik

5. N. F. Mott, H. S. W. Massey: The Theory of Atomic Collisions, 3rd ed. Oxford University Press, London (1965).

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