Characterization of Surface Variation of Chemically Amplified Photoresist to Evaluate Extreme Ultraviolet Lithography Stochastics Effects-Reference-Cited by-同舟云学术

Characterization of Surface Variation of Chemically Amplified Photoresist to Evaluate Extreme Ultraviolet Lithography Stochastics Effects

Published:2021-06-11 Issue:1 Volume:34 Page:63-70
ISSN:0914-9244
Container-title:Journal of Photopolymer Science and Technology
language:en
Short-container-title:J. Photopol. Sci. Technol.

Author:

Liu Eric¹,Hegazy Amir¹,Choi Hyeonseon¹,Weires Maximilian¹,Brainard Robert¹,Denbeaux Gregory¹

Affiliation:

1. College of Nanoscale Science and Engineering, State University of New York Polytechnic Institute

Publisher

Technical Association of Photopolymers, Japan

Subject

Materials Chemistry,Organic Chemistry,Polymers and Plastics

Link

https://www.jstage.jst.go.jp/article/photopolymer/34/1/34_63/_pdf

Reference32 articles.

1. 1. H. J. Levinson and T. A. Brunner, Proc. SPIE, 10809 (2018) 1080903.

2. 2. P. De Bisschop, J. Micro/Nanolithography, MEMS, MOEMS, 16 (2017) 1.

3. 3. P. P. Naulleau, C. N. Anderson, L.-M. Baclea-an, P. Denham, S. George, K. A. Goldberg, G. Jones, B. McClinton, R. Miyakawa, S. Rekawa, and N. Smith, Proc. SPIE, 7972 (2011) 797202.

4. 4. S. Bhattarai, A.R. Neureuther, and P. P. Naulleau, J. Vac. Sci. Technol. B, Nanotechnol. Microelectron. Mater. Process. Meas. Phenom., 35 (2017) 061602.

5. 5. C. A. Mack, Proc. SPIE, 11147 (2019) 111470A.

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