Author:
Gharbi A.,Tiron R.,Argoud M.,Chevalier X.,Belledent J.,Pradelles J.,Pimenta Barros P.,Navarro C.,Nicolet C.,Hadziioannou G.,Fleury G.,Barnola S.
Reference20 articles.
1. Block Copolymer Based Nanostructures: Materials, Processes, and Applications to Electronics
2. Simple and Versatile Methods To Integrate Directed Self-Assembly with Optical Lithography Using a Polarity-Switched Photoresist
3. The potential of block copolymer’s directed self-assembly for contact hole shrink and contact multiplication;Tiron,2013
4. SRAM, NAND, DRAM contact hole patterning using block copolymer directed self-assembly guided by small topographical templates;Bao,2011
5. Self-assembly patterning for sub-15nm half-pitch: a transition from lab to fab;Bencher,2011
Cited by
6 articles.
订阅此论文施引文献
订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献