Surface affinity role in graphoepitaxy of lamellar block copolymers

Author:

Claveau Guillaume1,Quemere Patrick1,Argoud Maxime1,Hazart Jerome1,Barros Patricia Pimenta1,Sarrazin Aurelien1,Posseme Nicolas1,Tiron Raluca1,Chevalier Xavier2,Nicolet Celia2,Navarro Christophe2

Affiliation:

1. CEA-LETI, MINATEC Campus, 17 Rue des Martyrs, 38054 Grenoble, France

2. ARKEMA FRANCE, Groupement de Recherches de Lacq, R.N. 117, BP34-64170 Lacq, France

Publisher

SPIE-Intl Soc Optical Eng

Subject

Electrical and Electronic Engineering,Mechanical Engineering,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Cited by 7 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. Study of plasma etching impact on chemoepitaxy directed self-assembly;Journal of Vacuum Science & Technology A;2021-05

2. Self-assembly for electronics;MRS Bulletin;2020-10

3. Expanding DSA process window with atmospheric control;Advances in Patterning Materials and Processes XXXVII;2020-03-23

4. Spacer patterning lithography as a new process to induce block copolymer alignment by chemo-epitaxy;Novel Patterning Technologies for Semiconductors, MEMS/NEMS, and MOEMS 2019;2019-03-26

5. Precise control of template affinity achieved by UV-assisted graphoepitaxy approach on silicon nanowires applications;Novel Patterning Technologies 2018;2018-03-19

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