Spacer patterning lithography as a new process to induce block copolymer alignment by chemo-epitaxy-Reference-Cited by-同舟云学术

Spacer patterning lithography as a new process to induce block copolymer alignment by chemo-epitaxy

Published:2019-03-26 Issue: Volume: Page:
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Container-title:Novel Patterning Technologies for Semiconductors, MEMS/NEMS, and MOEMS 2019
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Author:

Paquet Anne,LE PENNEC Aurélie,GHARBI Ahmed,GIAMMARIA Tommaso J.,RADEMAKER Guido,POURTEAU Marie-Line,MARIOLLE Denis,NAVARRO Christophe,NICOLET Célia,CHEVALIER Xavier,SAKAVUYI Kaumba,PAIN Laurent,NEALEY Paul,TIRON Raluca

Publisher

SPIE

Reference7 articles.

1. Samsung 7nm Enters Risk Production, Talks Roadmap, Scaling Boosters, and the ARM Ecosystem;Schor;WikiChip Fuse,2018

2. A track process for solvent annealing of high-χ BCPs;Guerrero,2017

3. Contact holes patterning by directed self-assembly of block copolymers: process window study

4. Surface affinity role in graphoepitaxy of lamellar block copolymers

5. Three-Tone Chemical Patterns for Block Copolymer Directed Self-Assembly;Williamson,2016

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1. Study of plasma etching impact on chemoepitaxy directed self-assembly;Journal of Vacuum Science & Technology A;2021-05

2. Resist-Free Directed Self-Assembly Chemo-Epitaxy Approach for Line/Space Patterning;Nanomaterials;2020-12-07

3. Establishing a sidewall image transfer chemo-epitaxial DSA process using 193 nm immersion lithography;Advances in Patterning Materials and Processes XXXVII;2020-04-03

4. Block copolymer line roughness measurements via PSD: application to fingerprint samples;Advances in Patterning Materials and Processes XXXVII;2020-03-25