Advancements in predictive plasma formation modeling-Reference-Cited by-同舟云学术

Advancements in predictive plasma formation modeling

Published:2016-03-18 Issue: Volume: Page:
ISSN:0277-786X
Container-title:Extreme Ultraviolet (EUV) Lithography VII
language:
Short-container-title:

Author:

Purvis Michael A.¹,Schafgans Alexander¹,Brown Daniel J. W.¹,Fomenkov Igor¹,Rafac Rob²,Brown Josh¹,Tao Yezheng¹,Rokitski Slava¹,Abraham Mathew¹,Vargas Mike¹,Rich Spencer¹,Taylor Ted¹,Brandt David¹,Pirati Alberto³,Fisher Aaron⁴,Scott Howard⁴,Koniges Alice⁵,Eder David⁴,Wilks Scott⁴,Link Anthony⁴,Langer Steven⁴

Affiliation:

1. Cymer LLC (United States)

2. Cymer, LLC (United States)

3. ASML Netherlands B.V. (Netherlands)

4. Lawrence Livermore National Lab. (United States)

5. Lawrence Berkeley National Lab. (United States)

Publisher

SPIE

Reference21 articles.

1. David C. Brandt, Igor V. Fomenkov, Nigel R. Farrar, Bruno La Fontaine, David W. Myers Daniel J. Brown Alex I. Ershov, Norbert R. Böwering, Daniel J. Riggs, Robert J. Rafac, Silvia De Dea, Rudy Peeters, Hans Meiling, Noreen Harned, Daniel Smith, Alberto Pirati, Robert Kazinczi in: Proc. SPIE Vol. 9048, Extreme Ultraviolet (EUV) Lithography V, Obert R. Wood II, Eric M. Panning, Eds., 90480C (2014).

2. Brandt, D.C., Fomenkov, I.V., Ershov, A.I., Partlo, W.N., Myers, D.W., Böwering, N.R., Farrar, N.R., Vaschenko, G.O., Khodykin, O.V., Bykanov, A.N., Hoffman, J.R., Chrobak, C.P, Srivastava, S.N., Ahmad, I., Rajyaguru, C., Golich, D.J., Vidusek, D.A., De Dea, S., Hou, R.R., in: Proc. of SPIE Vol. 7271, Alternative Lithographic Technologies, F. M. Schellenberg, B. M. La Fontaine, Eds., 727103, (2009).

3. Fomenkov, I.V., Brandt, D.C., Bykanov, A.N., Ershov, A.I., Partlo, W.N., Myers, D.W., Böwering, N.R., Farrar, N.R., Vaschenko, G.O., Khodykin, O.V., Hoffman, J.R., Chrobak, C.P., Srivastava, S.N., Golich, D.J., Vidusek, D.A., De Dea, S., Hou, R.R., in: Proc. of SPIE Vol. 7271, Alternative Lithographic Technologies, F. M. Schellenberg, B. M. La Fontaine, Eds., 727138 (2009).

4. Böwering, N.R., Fomenkov, I.V., Brandt, D.C., Bykanov, A.N., Ershov, A.I., Partlo, W.N., Myers, D.W., Farrar, N.R., Vaschenko, G.O., Khodykin, O.V., Hoffman, J.R., Chrobak, C.P., Srivastava, S.N., Ahmad, I., Rajyaguru, C., Golich, D.J., Vidusek, D.A., De Dea, S., Hou R.R., Journal of Micro/Nanolith. MEMS MOEMS 8(4), 041504 (2009).

5. Brandt, D.C, Fomenkov, I.V., Ershov, A.I., Partlo, W.N., Myers, D.W., Sandstrom, R.L., La Fontaine, B.M., Lercel, M.J., Bykanov, A.N., Böwering, N.R., Vaschenko, G.O., Khodykin, O.V., Srivastava, S.N., Ahmad, I., Rajyaguru, C., Das, P., Fleurov, V.B., Zhang, K., Golich, D.J., De Dea, S., Hou, R.R., Dunstan, W.J., Wittak, C.J., Baumgart, P., Ishihara, T., Simmons, R.D., Jacques, R.N., Bergstedt, R.A., in: Proc. of SPIE Vol. 7969, Extreme Ultraviolet (EUV) Lithography II, B. M. La Fontaine, P. P. Naulleau, Eds., 79691H (2011).

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