Author:
Liang Ted,Frendberg Eric,Bald Daniel J.,Penn Michael,Stivers Alan R.
Cited by
14 articles.
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1. EUV mask infrastructure and actinic pattern mask inspection;Extreme Ultraviolet (EUV) Lithography XI;2020-03-23
2. Mask Materials and Designs for Extreme Ultra Violet Lithography;Electronic Materials Letters;2018-03-21
3. EUV mask infrastructure readiness and gaps for TD and HVM;SPIE Proceedings;2015-11-11
4. E-beam invasiveness on 65 nm complementary metal-oxide semiconductor circuitry;Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena;2011-03
5. Gas-assisted focused electron beam and ion beam processing and fabrication;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;2008